• Introduction to Semiconductor Devices and Circuits
  • Lecture Schedules:
    • THA (Tue/Thu, 7:00am-8:00am, Rm 120)
    • THR (Tue/Thu, 8:30am-9:30am, Rm 120)
    • WFD (Wed/Fri, 10:00am-11:00am, Rm 120)

Announcements

  • 8/4: Welcome to EEE 41!
  • 8/4: This term we will be using Piazza for class discussion. The system is highly catered to getting you help fast and efficiently from classmates, in addition to the instructors. Rather than emailing questions to the teaching staff, we encourage you to post your questions on Piazza. Find our class page here.
  • 9/22: Please note the following schedule of DC #6 make-up classes for students with Friday DCs:
    • Sept 28, Monday, 9-10 am, Rm 422
    • Sept 28, Monday, 1-2 pm, Rm 422
    • Sept 28, Monday, 2-3 pm, Rm 422
    • Sept 28, Monday, 4-5 pm, Rm 422
  • 10/3: Due to the suspension of classes yesterday, another set of make-up classes will be given on Monday, Oct 5, for the Friday DCs. The schedule is the same as shown above.
  • 10/3: Problem Set 1; The deadline is on Oct. 13, Tuesday, 11AM.
  • 10/5: All make-up DC#7 classes today will be held in Room 229.
  • 10/5: All DC classes will have the Long Quiz #1 this week.
  • 10/15: There will be classes today.
  • Midterm Exam Solutions:
    • Part I
    • Part II
    • Part III (Errata shown below)
      • Final answer for item 3 is 4×10^-4 cm
      • Final answer for item 4 is 2×10^-7 cm
      • Final answer for item 5 is 3200 V/cm, from N to S
    • Part IV
  • 10/23: Grade sheet can be found here.
  • 10/30: Because of the class suspensions this afternoon, there will be make-up DC#9 classes on the following schedule:
    • Nov 4, Wednesday, 5:30-6:30pm, Rm 422
    • Nov 5, Thursday, 4-5pm, Rm 307
  • 11/11: WFD will have a make-up class on November 23, Monday, 4-6pm, at LC2.
  • 11/18: All DC sections will have their long quiz next week, Nov. 24 – 27.
  • 11/22: The scheduled make-up class tomorrow  for WFD will be postponed to next week. Keep posted for announcements.
  • 11/23: THA make-up class on 11/23 (Monday) is at 4-5:30pm, Rm 120.
  • 11/23: Please note that we are changing access permissions on the grade sheet whenever we are doing updates.
  • 11/26: THA make-up class on 12/1 (Tuesday), 4-5:30pm, room to be announced.
  • 11/27: WFD make-up class on 12/2 (Wednesday), 10-11:30am, Rm 120.
  • 12/15: Finals solution
  • 12/17: The passing grade for EEE 41 is 45. The grades breakdown is as follows: x >=66 (1.0), 61 <= x < 66 (1.5), 56 <= x <61 (2.0), 49 <= x < 56 (2.5), 45 <= x < 49 (3.0), 40 <= x < 45 (4.0), x < 40 (5.0). The removal exam will be on January 5, 2016. Time and venue TBA.
  • 12/17: You can still claim your papers at Rm 401. Returning of papers for rechecking of Midterms Part 1 and Finals is extended to December 18. Again, just place your exam papers in the box at Rm 401 with a note explaining your case. Do not reason out based on your current class standing. Also, the process is not iterative, i.e. you cannot have your papers rechecked again. Parts 2, 3, and 4 of the Midterms will not be accepted for rechecking.
  • 12/21: The instructors have already finished rechecking and the results are already reflected on the aggregated grade sheet (see the Dec21 tab). Just check whether your grades changed or not. For everyone, please have one last check on your grades. Inform us of any error before December 22, 12nn. We will be uploading the grades on CRS after.
  • 12/24: Removal exam is moved to morning of January 11, 2016. Exact time and venue is still TBA. Students are still allowed to bring their cheat sheet (1 page A4, back-to-back). Please wait for further announcements regarding the removals slip.
  • 1/5: Removal exam is moved to January 12, 2016. Exact time and venue is still TBA. Please wait for further announcements regarding the removals slip.
  • 1/6: Removal exam is from 9am to 12nn. We will just post an announcement at the lobby regarding the venue on the exam day itself. No need to worry regarding the removals slip. We are already arranging the matter. Just come on the exam day.

Exam Dates

  • First Exam: Saturday, October 17, 2015, 1:00pm – 4:00pm
  • Final Exam: Friday, December 11, 2015, 1:00pm – 4:00pm
  • Removal Exam: Monday, January 11, 2016, (morning) Tuesday, January 12, 2016, 9:00am – 12:00nn

Class Lectures

DateTitleSlides
18/4Introductionpdf
Semiconductor Fundamentals (3 weeks)
28/6Semiconductor materials; Si structure; Electrons and holespdf
38/11Energy-band model; Band-gap energy; Density of states; Dopingpdf
48/13Thermal equilibrium; Carrier distributions and Concentrations; Determination of the Fermi Energypdf
58/18Carrier properties and drift; Carrier scattering; Drift current; Resistivitypdf
68/20Electrostatic potential; Carrier diffusion; Generation and recombinationpdf
78/25Generation and recombination; Excess carrier concentrations; Minority Carrier Lifetimepdf
88/27Minority carrier lifetime; Continuity equations; Minority carrier diffusion; Quasi-Fermi levelspdf
Metal-Semiconductor Contacts (1 week)
99/1Work function; metal-semiconductor band diagram; depletion widthpdf
109/3I-V characteristics; Practical ohmic contacts; small-signal capacitance pdf
PN Junction Diodes (3 weeks)
119/8Electrostaticspdf
129/10I-V characteristicspdf
139/15Reverse-bias current; reverse-bias breakdownpdf
149/17Deviations from the ideal: R-G current, series resistance, high-level injection; narrow-base diodepdf
159/22Charge control model; Small-signal model; transient response: turn-off pdf
169/24Transient response: turn-on; diode applicationspdf
179/29Review
Bipolar Junction Transistors (3 weeks)
1810/1Introduction; BJT fundamentalspdf
1910/6Ideal transistor analysis; Ebers-Moll modelpdf
2010/8Deviations from the ideal; Gummel plot; Modern BJT structures pdf
2110/13Charge control model; base transit time; Small signal modelpdf
10/15No class (ACLE)
2210/20Cutoff frequency; transient responsepdf
2310/22PNPN devices
Metal Oxide Semiconductor (MOS) Capacitors (1 week)
2410/27MOS Structure; energy band diagram; Electrostaticspdf
2510/29Capacitance vs. voltage characteristicpdf
Metal Oxide Semiconductor (MOS) Field-Effect Transistors (FETs) (3 weeks)
2611/3MOSFET structure and operation; Qualitative theory; long-channel I-V characteristics pdf
2711/5 Modified long-channel I-V characteristics; Body effect parameter; PMOS I-V; small-signal modelpdf
2811/10 Body effect parameter; PMOS I-V; small-signal model
2911/12Sub-threshold leakage current; gate-length scaling; Velocity saturation
3011/17Short-channel effect; source/drain structure; drain-induced barrier lowering; excess current effects
3111/19IC technology; MOSFET fabrication process; CMOS latch-up
3211/24Review
3311/26Review

Discussion Class Slides and Homework

TitleSlides
(no solution)
Slides (w/solution)Quiz (w/ sol'n)
00Class Policies
01Electromagnetics Review & Crystal Lattice Structurespdf
02Energy Band Model and Carrier Concentrationpdfpdf
03Resistivity, Carrier Drift and Diffusionpdfpdf
EEE 42 Lab 3 Solutionspdf
04Continuity Equationspdfpdf
05MS Junction Electrostaticspdfpdf
06MS Junction Small-Signal and PN Electrostaticspdfpdf
07PN Electrostatics and I-Vpdfpdf
Long Quiz 1pdf
Problem Setpdf
08PN Small-signal and Transient Responsepdfpdf
09BJT Performance Parameters and Biasingpdfpdf
10Ebers-Moll Model and BJT Non-idealitiespdfpdf
11BJT Small-signal Analysis and MOS Capacitorspdfpdf
12MOS C-V and MOSFET I-Vpdfpdf
Long Quiz 2pdf

Textbook

  • Semiconductor Device Fundamentals by R. F. Pierret (Addison Wesley, 1996)

References

  1. Solid State Electronic Devices by B. G. Streetman & S. Banerjee (Prentice Hall, 2000)
  2. Fundamentals of Modern VLSI Devices by Y. Taur & T. H. Ning (Cambridge University Press, 1998)
  3. Semiconductor Devices by K. Kano (Prentice Hall, 1998)
  4. Introduction to Semiconductor Devices and Circuits, 2nd ed., by L. Sison (U.P. Press, 2008)